Get our free email newsletter

New Way to Transfer Thin Semiconductor Films Developed

New Way to Transfer Thin Semiconductor Films Developed | In Compliance Magazine

A new technique to transfer thin semiconductor films onto arbitrary substrates has been developed at North Carolina State University. This method is quicker than existing techniques and allows the films to be transferred from one substrate to another without creating any cracks.

The researchers use the physical properties of molybdenum sulfide (MoS2), a commonly used material in the semiconductor industry, to transfer the thin film using room temperature water, a tissue, and a pair of tweezers. This new method could lead the way for advances in flexible computing or photonic devices.

- Partner Content -

A Dash of Maxwell’s: A Maxwell’s Equations Primer – Part Two

Maxwell’s Equations are eloquently simple yet excruciatingly complex. Their first statement by James Clerk Maxwell in 1864 heralded the beginning of the age of radio and, one could argue, the age of modern electronics.

Watch a video to see how fast this new method is for transferring semiconducting thin films from one substrate to another. 

Related Articles

Digital Sponsors

Become a Sponsor

Discover new products, review technical whitepapers, read the latest compliance news, and check out trending engineering news.

Get our email updates

What's New

- From Our Sponsors -

Sign up for the In Compliance Email Newsletter

Discover new products, review technical whitepapers, read the latest compliance news, and trending engineering news.