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New Plasma Technology Improves Thin Film Processing

New Plasma Technology Improves Thin Film Processing

While developing a less expensive way to create supercapacitors for renewable energy storage, South Dakota State University Associate Professor Qi Hua Fan developed a new plasma technology that improves production efficiency by reducing time and energy.

Conventional chemical activation can take several hours and must be performed at approximately 1,760 degrees Fahrenheit. The new technology called plasma activation triggers biochar in five minutes at room temperature, advancing modern optoelectronic materials and devices. Plasma activation could lead to display images that are brighter and clearer.

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