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New Method of Lithography Developed

New Method of Lithography Developed | In Compliance Magazine

Nanoengineers at the University of California, San Diego, have developed a new lithography method that is providing an affordable and easier method to current state-of-the-art nanofabrication manufacturing technology.

The team created nanoscale robots, known as nanorobots or nanomotors, which swim over the surface of light-sensitive material to produce complex surface pattern to form sensors and electronic components on nanoscale devices. This new technique combines controlled movement with distinctive light-focusing or light-blocking features of the nanorobots that could provide a framework to developed autonomous writing of nanopatterns at a reduced cost compared to today’s e-beam writers.

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VSWR and its Effects on Power Amplifiers

Voltage Standing Wave Ratio results from an impedance mismatch between a source (an amplifier) and a load (test application). This mismatch can influence the performance of the source.

Read more about the new method of lithography developed.

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